Thank you to all attendees for participating in last week's Joint Symposium on US and European Patent Practice in Munich. While the laws of patent practice are ever-changing worldwide, we hope all participants were able to take away some important information on how these changes affect the practices in both the US and Europe.

A special thank you to our esteemed colleagues at Maiwald for co-hosting this event and we look forward to continuing this event in the future.

Pictured: Andrew Ollis, Daniel Pereira, Martina Boidol, James Love, Norbert Hansen, Annelie Wünsche, Derk Vos, David Longo and Tobias Philipp